| 发明名称 |
SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY |
| 摘要 |
Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid generator, a solvent; and a self-topcoating resist additive. A method of forming a patterned material layer on a substrate using the resist composition is also disclosed.
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| 申请公布号 |
US2007254235(A1) |
申请公布日期 |
2007.11.01 |
| 申请号 |
US20060380731 |
申请日期 |
2006.04.28 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ALLEN ROBERT D.;BROCK PHILLIP J.;LARSON CARL E.;SANDERS DANIEL P.;SOORIYAKUMARAN RATNAM;SUNDBERG LINDA K.;TRUONG HOA D.;WALLRAFF GREGORY M. |
| 分类号 |
G03C1/00 |
主分类号 |
G03C1/00 |
| 代理机构 |
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| 主权项 |
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