SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE MANUFACTURING METHOD

摘要

Provided are a substrate treatment apparatus (1) and a substrate manufacturing method by which process management is facilitated and the structure is simplified. A substrate (W) is stored in a treatment tank (2) to be impregnated with a treatment solution (F), the treatment solution (F) sucked from the inside of the treatment tank (2) is heated up to 55°C by a heater (6), then, an ozone bubble treatment solution (FB) is generated by mixing ozone gas. Then, the ozone bubble treatment solution (FB) is supplied to a film (Wa) (subject to be treated) in a high-speed water flow status by jetting the ozone bubble treatment solution by an ozone bubble jetting section (9).