Method of making resist and deep etch lithographic printing plates with ferric ammonium compound sensitized plates,申请号US19600061843-传众专利搜索

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发明名称	Method of making resist and deep etch lithographic printing plates with ferric ammonium compound sensitized plates
摘要
申请公布号	US3169065(A)	申请公布日期	1965.02.09
申请号	US19600061843	申请日期	1960.10.11
申请人	HARRIS-INTERTYPE CORPORATION	发明人	SORKIN JACK L.;ADAMS DOLOR N.
分类号	B41N3/03;G03F7/038	主分类号	B41N3/03
代理机构		代理人
主权项
地址

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