| 发明名称 |
RESIN COMPOSITION, METHOD FOR PATTERN FORMING USING THE SAME, AND METHOD FOR FORMING CAPACITOR |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer resin composition, a method for forming pattern by using the same and a method for forming a capacitor. <P>SOLUTION: The invention relates to the polymer resin composition suitable for forming a blocking membrane, comprising 75-93 mass% of a copolymer composed of benzylmethacrylate monomer, methacrylic acid monomer and hydroxyethylmethacrylate monomer, 1-7 mass% of a crosslinking agent, 0.01-0.5 mass% of a heat acid generator, 0.01-1 mass% of photo acid generator, 0.00001-0.001 mass% of an organic base and a solvent of the balance mass%. A membrane for blocking a part of a substrate is easily formed by using the polymer resin composition. <P>COPYRIGHT: (C)2008,JPO&INPIT |
| 申请公布号 |
JP2007284681(A) |
申请公布日期 |
2007.11.01 |
| 申请号 |
JP20070110899 |
申请日期 |
2007.04.19 |
| 申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
KANG KYONG-RIM;AHN SUN-YUL;KIM YOUNG-HO;KIM JAE-HYUN;YANG JOO-HYUNG;KIM TAE-SUNG |
| 分类号 |
C08L33/14;C08F220/06;C08F220/18;C08F220/28;C08K5/00;C08L61/28;G03F7/004;G03F7/033;G03F7/038;H01L21/027 |
主分类号 |
C08L33/14 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
