| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a multi-layered thin film structure having different physical properties on a base material using a plasma-enhanced chemical vapor deposition (PECVD) process. <P>SOLUTION: The method includes changing a plasma frequency to be applied, while not changing a composition ratio of a mixed gas for plasma generation, to sequentially form thin films corresponding to a plasma composition of the plasma frequency. <P>COPYRIGHT: (C)2008,JPO&INPIT |
