发明名称 |
MANUFACTURING METHOD OF LONG POLISHING PAD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of highly productively manufacturing a long polishing pad capable of preventing slurry from leaking from between a polishing region and a light transmission region. <P>SOLUTION: The method of manufacturing the long polishing pad includes the steps of: preparing a bubble-dispersed urethane composition 8 by means of a mechanical froth method; continuously or intermittently discharging a light transmission region forming material 14 to a predetermined position on face bars 10 and 16 while feeding the face bars; continuously discharging the bubble-dispersed urethane composition onto the face bar with no light transmission region forming material disposed; stacking another face bar on the discharged light transmission region forming material and bubble-dispersed urethane composition; making a long polishing layer consisting of the light transmission region and the polishing region integrally molded by hardening the light transmission region forming material and the urethane composition while controlling a thickness to be uniform; and cutting the long polishing layer. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007283458(A) |
申请公布日期 |
2007.11.01 |
申请号 |
JP20060115878 |
申请日期 |
2006.04.19 |
申请人 |
TOYO TIRE & RUBBER CO LTD |
发明人 |
WATANABE TSUGIO;HIROSE JUNJI |
分类号 |
B24B37/20;B29C39/18;H01L21/304 |
主分类号 |
B24B37/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|