发明名称 MANUFACTURING METHOD OF LONG POLISHING PAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of highly productively manufacturing a long polishing pad capable of preventing slurry from leaking from between a polishing region and a light transmission region. <P>SOLUTION: The method of manufacturing the long polishing pad includes the steps of: preparing a bubble-dispersed urethane composition 8 by means of a mechanical froth method; continuously or intermittently discharging a light transmission region forming material 14 to a predetermined position on face bars 10 and 16 while feeding the face bars; continuously discharging the bubble-dispersed urethane composition onto the face bar with no light transmission region forming material disposed; stacking another face bar on the discharged light transmission region forming material and bubble-dispersed urethane composition; making a long polishing layer consisting of the light transmission region and the polishing region integrally molded by hardening the light transmission region forming material and the urethane composition while controlling a thickness to be uniform; and cutting the long polishing layer. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007283458(A) 申请公布日期 2007.11.01
申请号 JP20060115878 申请日期 2006.04.19
申请人 TOYO TIRE & RUBBER CO LTD 发明人 WATANABE TSUGIO;HIROSE JUNJI
分类号 B24B37/20;B29C39/18;H01L21/304 主分类号 B24B37/20
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