| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a formation method of a pattern capable of forming a fine pattern efficiently and inexpensively. <P>SOLUTION: The formation method of a pattern includes: a first process for forming a first pattern including a first opening having first width on one surface of a substrate capable of transmitting exposure light using a first material; a second process for forming a resist film on one surface of a substrate where the first pattern is formed; and a third process for forming a second pattern corresponding to the first pattern on one surface of the substrate with resist, by applying exposure light to the substrate from the other surface of the substrate and exposing the resist film to near-field light formed near the first opening. <P>COPYRIGHT: (C)2008,JPO&INPIT |
