| 摘要 |
A method for manufacturing a display substrate is provided to form first and second contact holes of gate and source pads without damage of a first molybdenum layer of a gate end pattern and a source end pattern by using a first photo pattern and a second photo pattern, thereby preventing corrosion of an aluminum layer which is an actual low resistance metal layer. Gate lines, a gate electrode(G) and storage lines of a switching device are formed on a base substrate(110). Source lines crossing the gate lines, a source electrode(S) of the switching device, a drain electrode(D) opposite to the source electrode, and a source metal pattern(164) covering the storage lines are formed. A first photo pattern(192a) having first thickness is formed at first ends of the gate lines. A second photo pattern(192b) having second thickness is formed on second ends of the source lines. A third photo pattern(192c) having third thickness is formed on the switching device, the gate lines and the storage lines. The first photo pattern to the third photo pattern are used to remove the source metal pattern and expose a side of the end of the drain electrode, and the first end and the second end. A transparent electrode layer is respectively contacted with the side of the end of the drain electrode, and the first end and the second end. The third photo pattern is removed to form a pixel electrode contacting with the side of the end of the drain electrode, a first pad pattern contacting with the first end, and a second pad pattern contacting with the second end. |
