发明名称 FIELD EFFECT TRANSISTOR USING AMORPHOUS OXIDE FILM AS GATE INSULATING LAYER
摘要 PROBLEM TO BE SOLVED: To provide a field effect transistor having favorable transistor characteristics and operation stability. SOLUTION: In the field effect transistor, a channel layer 11, a source electrode 13, a drain electrode 14, a gate insulating layer 12, and a gate electrode 15 are formed on a substrate 10. The channel layer is composed of an amorphous oxide, and the gate insulating layer is composed of an amorphous oxide containing Y. The amorphous oxide can be used containing Y, for example, an oxide including Y, and Mn or Ti with a composition to be made into a perovskite structure when it is formed under the condition of crystallization. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007288156(A) 申请公布日期 2007.11.01
申请号 JP20070057256 申请日期 2007.03.07
申请人 CANON INC 发明人 KACHI NOBUYUKI;YABUTA HISATO
分类号 H01L29/786 主分类号 H01L29/786
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