发明名称 Methods of forming material over substrates
摘要 The invention includes ALD-type methods in which two or more different precursors are utilized with one or more reactants to form a material. In particular aspects, the precursors are hafnium and aluminum, the only reactant is ozone, and the material is hafnium oxide predominantly in a tetragonal crystalline phase.
申请公布号 US2007252244(A1) 申请公布日期 2007.11.01
申请号 US20060413466 申请日期 2006.04.28
申请人 MICRON TECHNOLOGY, INC. 发明人 SRIVIDYA CANCHEEPURAM V.;ROCKLEIN NOEL;VERNON JOHN;NELSON JEFF;GEALY F. D.;KORN DAVID
分类号 H01L23/58;H01L21/469 主分类号 H01L23/58
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