摘要 |
An EUV light source is disclosed that may include a laser source, e.g. CO<SUB>2</SUB> laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power. |
申请人 |
CYMER, INC.;ERSHOV, ALEXANDER, L.;PARTLO, WILLIAM, N.;BOWERING, NORBERT, N. |
发明人 |
ERSHOV, ALEXANDER, L.;PARTLO, WILLIAM, N.;BOWERING, NORBERT, N. |