| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive polyamide ester composition useful for the production of electric/electronic materials, having a wide film thickness region in which i-line exposure is possible, and capable of giving a high resolution polyimide pattern. <P>SOLUTION: The photosensitive polyamide ester composition comprises (A) 100 parts by mass of a polyamide ester comprising a repeating unit represented by formula (1), (B) 1-15 parts by mass of a photoinitiator, and (C) 30-600 parts by mass of a solvent. <P>COPYRIGHT: (C)2008,JPO&INPIT |
