| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of supplying a large amount of micro bubbles around a substrate while preventing increase in size of the substrate processing apparatus. SOLUTION: In the substrate processing apparatus 1, a buffer bath 63 is provided in the middle of a path of a pure water supply part 40, and micro bubble generators 64a and 64b are provided in the buffer bath 63. When processing a substrate W, a large amount of micro bubbles are generated in the buffer bath 63 and the micro bubbles are supplied to a process bath 10 from the buffer bath 63. Consequently, by using the micro bubble generators 64a and 64b of small size, a large amount of micro bubbles are supplied around the substrate W while increase in size of the substrate processing apparatus 1 is suppressed. COPYRIGHT: (C)2008,JPO&INPIT
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