发明名称 |
Thin film transistor and method of fabricating the same |
摘要 |
A thin film transistor (TFT) and a method of fabricating the TFT may be provided. The TFT may include a substrate; a channel formed on the substrate; source and drain layers formed on both ends of the channel; a gate insulator covering the source and drain layers and the channel; a gate formed on the gate insulator; an ILD (interlayer dielectric) layer covering the gate; and/or source and drain electrodes contacting the source and drain layers through contact holes formed in the ILD layer and the gate insulator. |
申请公布号 |
US2007252207(A1) |
申请公布日期 |
2007.11.01 |
申请号 |
US20070706316 |
申请日期 |
2007.02.15 |
申请人 |
SAMSUNG ELECTRONICS CO. LTD. |
发明人 |
PARK JAE-CHUL;PARK YOUNG-SOO;CHA YOUNG-KWAN |
分类号 |
H01L29/786;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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