发明名称 Thin film transistor and method of fabricating the same
摘要 A thin film transistor (TFT) and a method of fabricating the TFT may be provided. The TFT may include a substrate; a channel formed on the substrate; source and drain layers formed on both ends of the channel; a gate insulator covering the source and drain layers and the channel; a gate formed on the gate insulator; an ILD (interlayer dielectric) layer covering the gate; and/or source and drain electrodes contacting the source and drain layers through contact holes formed in the ILD layer and the gate insulator.
申请公布号 US2007252207(A1) 申请公布日期 2007.11.01
申请号 US20070706316 申请日期 2007.02.15
申请人 SAMSUNG ELECTRONICS CO. LTD. 发明人 PARK JAE-CHUL;PARK YOUNG-SOO;CHA YOUNG-KWAN
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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