发明名称 |
METHOD OF FORMING A PHOTORESIST ELEMENT |
摘要 |
A method of forming a photoresist element comprising the steps of: preparing a hot melt photoresist mixture; applying the photoimageable hot melt composition to a film substrate using a slot die coating system; cooling the hot melt sufficiently to prevent flow; and applying a protective cover film to the opposite surface of the partially cooled composition, thereby forming a photoresist element.
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申请公布号 |
WO2006124552(A3) |
申请公布日期 |
2007.11.01 |
申请号 |
WO2006US18361 |
申请日期 |
2006.05.12 |
申请人 |
MICROCHEM CORP.;JOHNSON, DONALD, W. |
发明人 |
JOHNSON, DONALD, W. |
分类号 |
G03C1/76 |
主分类号 |
G03C1/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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