| 摘要 |
A cleaning solution recycling system and a method for recycling cleaning solution are provided to reduce a manufacturing cost of a semiconductor device by storing a cleaning solution in a wet cleaning device. A cleaning solution recycling system includes a first wet cleaning device(10), a cleaning solution recycling device(20), a second wet cleaning device(30), and a CPU(40). The first wet cleaning device cleans a wafer by using a cleaning solution containing a chemical agent and includes a drain for ejecting the cleaning solution. The cleaning solution recycling device collects the ejected cleaning solution, recycles the used cleaning solution and stores the recycled cleaning solution. The second wet cleaning device is connected to the cleaning solution recycling device and receives the recycled cleaning solution. The CPU controls the overall components.
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