| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor-deposited film manufacturing method capable of preventing any splash, and continuously performing the consistent vapor deposition without using any complicated mechanism. SOLUTION: The vapor-deposited film manufacturing method for depositing a vapor-deposited film on a substrate 3 includes a first step of feeding a vapor deposition material 6 to a crucible 7, a second step of melting the vapor deposition material by irradiating first electron beams for melting straight to the vapor deposition material 6 fed to the crucible 7, a third step of vaporizing the vapor deposition material 6 by irradiating second electron beams for evaporation straight on the heated and melted vapor deposition material 6, and a fourth step of feeding the evaporated vapor deposition material 6 on the substrate 3. A first electron beam irradiation area 11a and a second electron beam irradiation area 11b are substantially parallel to each other. Generation of splash caused by sudden temperature change is prevented, and consistent vapor deposition can be continuously performed without using any complicated mechanism. COPYRIGHT: (C)2008,JPO&INPIT
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