| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of calibrating an aligner which can accurately detect illumination distribution within an exposure area on a substrate. <P>SOLUTION: The method includes a first measuring step to measure illumination distribution on a sensitive substrate by using a light reflected on the reflection surface of a reference plate that is arranged on the same plane as a reflection type mask, a second measuring step to measure illumination distribution on the sensitive substrate by placing a calibration mask having a reflection surface as reference on a mask stage and using a light reflected on the reflection surface of the calibration mask, an illumination distribution calculation step to calculate illumination distribution of an aligner by using the reflectance distribution of the reflection surface of the calibration mask that is stored in a first memory part and the illumination distribution on the sensitive substrate that is measured in the second measuring step, and an updating step to update the reflectance distribution on the reflection surface of the reference plate by using the illuminance distribution that is calculated in the illumination distribution calculation step and is in the aligner and the illuminance distribution on the sensitive substrate that is measured in the first measuring step and uses a light reflected on the reflection surface of the reference plate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
