A CLEANING METHOD FOR CHAMBER OF RAPID THERMAL PROCESS

摘要

A method for cleaning an RTP chamber is provided to reduce a cleaning time by performing an in-situ cleaning process by injecting an oxide gas into the RTP chamber and heating the RTP chamber. An oxide gas is introduced into a chamber(S1). A temperature inside the chamber is raised from an initial temperature to a target temperature(S2). The inside temperature of the chamber is maintained at the target temperature for a predetermined period of time(S3). The inside temperature of the chamber is decreased to the initial temperature(S4).