| 发明名称 |
SYSTEM AND METHOD FOR CRITICAL DIMENSION REDUCTION AND PITCH REDUCTION |
| 摘要 |
A method of forming a feature includes forming a mask of a first material on an underlying layer, the mask having an incorrect profile. The profile of the mask is corrected and a feature is formed in the underlying layer. A system for forming a feature is also disclosed.
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| 申请公布号 |
WO2007005204(A3) |
申请公布日期 |
2007.11.01 |
| 申请号 |
WO2006US22890 |
申请日期 |
2006.06.12 |
| 申请人 |
LAM RESEARCH CORPORATION;CHARATAN, ROBERT |
发明人 |
CHARATAN, ROBERT |
| 分类号 |
G03F1/00;G03C5/00;G03F9/00;G06F17/50 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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