发明名称 MEASUREMENT OF CRITICAL DIMENSIONS USING X-RAY DIFFRACTION IN REFLECTION MODE
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus which are improved, in order to measure a dimension of a periodic feature on a surface of a sample based on a detection of X-rays scattered from the surface. SOLUTION: The method for X-ray analysis of the sample includes directing of a beam of X-rays to impinge on an area of the periodic feature on the surface of the sample, and receiving the X-rays scattered from the surface in a reflection mode so as to detect a diffraction spectrum in the scattered X-rays as a function of the azimuth. The diffraction spectrum is analyzed in order to determine the dimensions of the structure. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007285923(A) 申请公布日期 2007.11.01
申请号 JP20060114489 申请日期 2006.04.18
申请人 JORDAN VALLEY SEMICONDUCTORS LTD 发明人 MAZOR ISAAC;YOKHIN BORIS
分类号 G01B15/02;G01N23/20 主分类号 G01B15/02
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