| 摘要 |
<p>Defect distributions on substrates processed by candidate equipment causing a failure are placed one over another, and a first defect distribution overlapped image is created. Defect distributions on substrates processed by equipment other than the candidate equipment in the same process as the process performed by the candidate equipment are placed one over another, and a second defect distribution overlapped image is created. On a certain display screen, the first defect distribution overlapped image and the second defect distribution overlapped image are compared and displayed. A user can intuitively grasp whether the candidate equipment specified by this system is actually causing abnormality or not by view, and judgment can be made rapidly and easily compared with conventional cases.</p> |
