| 摘要 |
A PHOTOLITHOGRAPHY METHOD INCLUDES THE STEPS OF (A) FORMING A FILM BY COATING A FILM FORMING COMPOSITION HAVING A BONDING RESIN AND A FILM FORMING MATERIAL ON A SUBSTRATE AND DRYING THE RESULTANT; (B) SELECTIVELY COATING A PHOTOSENSITIVE COMPOSITION COMPRISING A PHOTOSENSITIZER ONLY ON A PREDETERMINED PORTION OF THE FILM, ACCORDING TO A DESIRED FILM PATTERN; (C) EXPOSING THE RESULTANT OBTAINED IN STEP (B); AND (D) FORMING A DESIRED FILM PATTERN BY DEVELOPING THE EXPOSED RESULTANT. THEREFORE, A FILM PATTERN HAVING EXCELLENT FILM CHARACTERISTICS CAN BE MANUFACTURED EASILY AND EFFICIENTLY. THE PHOTOLITHOGRAPHY METHOD CAN BE APPLIED TO ANY PRODUCT WHICH REQUIRES THE FORMATION OF A FILM PATTERN, FOR EXAMPLE, A VFD, CRT, FED OR PDP.
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