Lithographic apparatus and device manufacturing method,申请号EP20050076479-传众专利搜索

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法人/股东/高管

发明名称	Lithographic apparatus and device manufacturing method
摘要
申请公布号	EP1610183(A3)	申请公布日期	2007.10.31
申请号	EP20050076479	申请日期	2005.06.23
申请人	ASML NETHERLANDS B.V.	发明人	LOF, JOERI;MULKENS, JOHANNES C. H.;MERTENS, JEROEN J. S. M.;VAN DER NET, ANTONIUS J.;VAN DER HAM, RONALD;LALLEMANT, NICHOLAS A.;BECKERS, MARCEL
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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