发明名称 |
SEMICONDUCTOR WAFER SURFACE PROTECTING SHEET AND SEMICONDUCTOR WAFER PROTECTING METHOD USING SUCH PROTECTING SHEET |
摘要 |
A semiconductor wafer surface protection sheet which can prevent breakage of a semiconductor wafer even when a circuit-formed surface of the semiconductor wafer has a significant unevenness, and a method for protecting the semiconductor wafer by using such protection sheet. The semiconductor wafer surface protection sheet includes at least one resin layer (A) satisfying a relationship of G' (60) / G' (25) < 0.1, where G' (25) is a storage elastic modulus at 25°C, and G' (60) is a storage elastic modulus at 60°C The semiconductor wafer protecting method using such sheet is also provided.
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申请公布号 |
EP1850375(A1) |
申请公布日期 |
2007.10.31 |
申请号 |
EP20060713838 |
申请日期 |
2006.02.16 |
申请人 |
MITSUI CHEMICALS, INC. |
发明人 |
SAIMOTO, YOSHIHISA;URAKAWA, TOSHIYA;NAKAJIMA, AKEMI;AKAI, IKUO;AIHARA, SHIN |
分类号 |
H01L21/683;C09J7/02;H01L21/68 |
主分类号 |
H01L21/683 |
代理机构 |
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地址 |
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