Plasma source, has process gas supplying device formed as metallic block, in which gas channel with two channel areas runs, where channel areas flow under angle of specific degrees to one another

摘要

The source has a plasma area (2) surrounded by a plasma container, and a process gas supplying device (3) for supply of a process gas into the plasma area, which is ionized by electrical gas discharge. The process gas supplying device is formed as a metallic block (4), in which a gas channel with two channel areas runs, where the areas flow under an angle of 90 degrees to one another. The gas channel stays in connection with a gas inlet connection (6), to which a gas hose is connectable. A gas shower (9) is arranged within the plasma container.