发明名称 |
PROCESS FOR FORMING SOLDER RESIST FILM |
摘要 |
<p>A method for forming a solder resist film is provided to improve surface curing characteristics and to enhance the term of validity of a solder resist ink by controlling the injection period of a surface photoinitiator. A method for forming a solder resist film comprises the steps of preparing a solder resist ink base comprising a base resin, a pigment, a filler and a first surface photoinitiator, and a solder resist ink auxiliary comprising a base resin and a filler; mixing the base, the auxiliary and a second surface photoinitiator to obtain a solder resist ink composition; coating the solder resist ink composition on the surface of a printed circuit board; and irradiating UV rays to cure the solder resist ink composition completely.</p> |
申请公布号 |
KR100771330(B1) |
申请公布日期 |
2007.10.29 |
申请号 |
KR20060094904 |
申请日期 |
2006.09.28 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
NOH, JUNG HYUN;JANG, JONG SIK;MOON, HYUN IL;PARK, JONG WON |
分类号 |
G03F7/004;H05K3/00 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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