发明名称 PROCESS FOR FORMING SOLDER RESIST FILM
摘要 <p>A method for forming a solder resist film is provided to improve surface curing characteristics and to enhance the term of validity of a solder resist ink by controlling the injection period of a surface photoinitiator. A method for forming a solder resist film comprises the steps of preparing a solder resist ink base comprising a base resin, a pigment, a filler and a first surface photoinitiator, and a solder resist ink auxiliary comprising a base resin and a filler; mixing the base, the auxiliary and a second surface photoinitiator to obtain a solder resist ink composition; coating the solder resist ink composition on the surface of a printed circuit board; and irradiating UV rays to cure the solder resist ink composition completely.</p>
申请公布号 KR100771330(B1) 申请公布日期 2007.10.29
申请号 KR20060094904 申请日期 2006.09.28
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 NOH, JUNG HYUN;JANG, JONG SIK;MOON, HYUN IL;PARK, JONG WON
分类号 G03F7/004;H05K3/00 主分类号 G03F7/004
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