发明名称 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>Disclosed is a positive-type photosensitive resin composition comprising: (a) an alkali-soluble resin; (b) a quinone diazide compound; (c) a heat sensitive compound which colors upon being heated and which shows an absorption maximum at a wavelength of not less than 350 nm and not more than 700 nm; and (d) a compound which does not have an absorption maximum at a wavelength of not less than 350 nm to less than 500 nm, and has an absorption maximum at a wavelength of not less than 500 nm and not more than 750 nm. The composition is preferably used for forming light-blocking separators or black matrices of organic electroluminescent devices and liquid crystal display elements.</p>
申请公布号 SG135954(A1) 申请公布日期 2007.10.29
申请号 SG20040019048 申请日期 2004.04.06
申请人 TORAY INDUSTRIES, INC 发明人 MIYOSHI KAZUTO;OKUDA RYOJI;TOMIKAWA MASAO
分类号 G03F7/00;G03F7/022;G03F7/023;G03F7/105;(IPC1-7):G03F7/022 主分类号 G03F7/00
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