| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputter film deposition apparatus suitable for deposition of an optical film, and to provide a sputter film deposition method using the sputter film deposition apparatus. SOLUTION: In the sputter film deposition apparatus, a substrate conveyor 2 is disposed in a vacuum chamber 3, and sputter regions 4, 5, 6 where ultrathin films made of bulk material are formed on a substrate 1 by rotary cylindrical magnetron sputtering, a reaction region 7 where the ultrathin film is converted to a desired compound ultrathin film by a reactive gas and an assist region 8 are disposed in a space between the substrate conveyor 2 and the vacuum chamber 3 outside the substrate conveyor 2. The reaction region 7 is provided with a plasma generation means which generates inductively coupled plasma of the reactive gas in the region, and the plasma generation means comprises a high frequency electric source 11 and a coil electrode 12 disposed wall of the vacuum chamber 3 and an inductive electromagnetic field introducing window 13 having a desired length in the circumferential direction of rotation of the substrate conveyor 2. Thus, the substrate 1 is conveyed from the sputter regions 4, 5, 6 to the assist region 8 and the reaction region 7, and the processes are repeated to form the desired compound thin film on the substrate 1. COPYRIGHT: (C)2008,JPO&INPIT
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