发明名称 |
SURFACE MODIFYING METHOD, MANUFACTURING METHOD OF SUBSTRATE WITH FILM, DROPLET DISCHARGE HEAD AND DROPLET DISCHARGE APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a surface modifying method by which reactivity of a film surface to a coupling agent, for example, is efficiently increased while maintaining properties of a polyorganosiloxane film excellent in chemical resistance, a manufacturing method of a substrate with a film by which the substrate with the polyorganosiloxane film is efficiently manufactured, a droplet discharge head equipped with the substrate with the film manufactured by this method and a droplet discharge apparatus equipped with the droplet discharge head. SOLUTION: The surface modifying method of this invention is a method for selectively changing polyorganosiloxane existing near an upper surface of the polyorganosiloxane film 30 to SiO<SB>2</SB>and has a 1st process of preparing the polyorganosiloxane film 30 on the substrate 2 and a 2nd process of irradiating the polyorganosiloxane film 30 with ultraviolet rays from an upper surface side in an atmosphere where gaseous steam partial pressure is 0.2 to 0.9 kPa at an ordinary temperature. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2007275711(A) |
申请公布日期 |
2007.10.25 |
申请号 |
JP20060102558 |
申请日期 |
2006.04.03 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MATSUO YASUHIDE;TAKAHASHI HIROKAZU |
分类号 |
B05D3/06;B05C5/00;B05D7/24;B41J2/045;B41J2/055;B41J2/16 |
主分类号 |
B05D3/06 |
代理机构 |
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地址 |
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