发明名称 HIGH-CONCENTRATION SILICA SLURRY AND METHOD FOR PRODUCING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a high-concentration silica slurry which has a solid concentration of 20 wt.% or more and is stable for a long time with a positive charge. SOLUTION: There is used a high-concentration silica slurry having a silica concentration of 20-50%, a pH of 1.5-5.5, a conductivity of 300-1,500μS/cm, and a zeta potential of silica particles in the high-concentration silica slurry of +10 to +80 mV. Such a high-concentration silica slurry is produced by grinding and dispersing a silica gel in water to obtain a negatively charged slurry, mixing the obtained slurry with a cationic polymer having a molecular weight of 2,000-100,000, washing the obtained water-containing silica with water to remove a salt, and then re-dispersing the resulting gel. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007277023(A) 申请公布日期 2007.10.25
申请号 JP20060102380 申请日期 2006.04.03
申请人 TOSOH CORP 发明人 YAMAMOTO KAZUAKI
分类号 C01B33/141 主分类号 C01B33/141
代理机构 代理人
主权项
地址