发明名称 NITRIDE-BASED SEMICONDUCTOR SUBSTRATE, METHOD OF MAKING THE SAME AND EPITAXIAL SUBSTRATE FOR NITRIDE-BASED SEMICONDUCTOR LIGHT EMITTING DEVICE
摘要 A nitride-based semiconductor substrate has a substrate formed of a nitride-based semiconductor crystal having a mixed crystal composition with three elements or more. The substrate has a diameter of not less than 25 mm, and a thermal resistivity in a range of 0.02 Kcm<SUP>2</SUP>/W to 0.5 Kcm<SUP>2</SUP>/W in its thickness direction.
申请公布号 US2007246733(A1) 申请公布日期 2007.10.25
申请号 US20060538638 申请日期 2006.10.04
申请人 HITACHI CABLE, LTD. 发明人 OSHIMA YUICHI
分类号 H01L33/32;H01L33/06 主分类号 H01L33/32
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