EXPOSURE METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A substrate is exposed through a first operation wherein a prescribed reference surface is irradiated with detection light and the surface position information of the reference surface is detected based on the reception results of the detection light through the reference surface, and a second operation wherein a prescribed area on a first surface of a first mask is irradiated with the detection light and the surface position information of the area is detected based on the reception results of the detection light through the first surface. The second operation is performed a plurality of times for each of a plurality of areas on the first surface, and the first operation is performed prior to every second operation.