| 摘要 |
<p>A method for fabricating a thin film pattern layer is provided to reduce the quantity of ink injected into the same receiving space by at least two nozzles by injecting the ink at different rates. A substrate(100) with a plurality of banks(102) is prepared wherein the bank and the substrate define a plurality of receiving spaces(104) in common. Ink including a solvent with a high boiling point is injected into each receiving space by using at least two nozzles(202,204). The ink in each receiving space is solidified to form a thin film pattern layer on the substrate. A process for forming the bank can include the following steps. A photoresist layer is formed on the substrate. The photoresist is exposed by using a photomask having a pattern. The exposed photoresist layer is developed to form a bank made of a photoresist layer.</p> |
