发明名称 |
GATE STRUCTURE OF INTEGRATED CIRCUIT MEMORY DEVICE HAVING CHARGE STORING NANO CRYSTALS IN METAL OXIDE DIELECTRIC FILM AND METHOD OF FORMING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a gate structure of an integrated circuit memory device having charge storing nano crystals in a metal oxide dielectric film and a method of forming the gate structure. <P>SOLUTION: The method of forming a gate structure of an integrated circuit memory device includes forming a metal oxide dielectric film 150 on an integrated circuit substrate 100. Ions of an element selected from group IV of the periodic table and having a thermal diffusivity no larger than 0.5 cm<SP>2</SP>/s, such as Ge, are injected into the dielectric film to form a charge storing region in the dielectric film with a tunnel dielectric film 135 formed under the charge storing region and a capping dielectric film 140 formed on the charge storing region. The substrate 100 including the dielectric film 150 is thermally treated to form a plurality of discrete charge storing nano crystals 130_NC in the charge storing region. A gate electrode layer 160 is formed on the dielectric film 150. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2007281470(A) |
申请公布日期 |
2007.10.25 |
申请号 |
JP20070097661 |
申请日期 |
2007.04.03 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
CHOI SAM-JONG;CHO KYOO-CHUL;CHOI SOO-YEOL;KIM YONG-KWON;PARK YOUNG-SOO;IN SANKOKU;PARK HAE-JIN;KIM SANG-SIK |
分类号 |
H01L21/8247;H01L21/8242;H01L27/108;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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