| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for a resist base layer film which can reduce resist footing pattern and improve the shape of the pattern, and the resist base layer film using the same. <P>SOLUTION: A predetermined amount of a quaternary ammonium compound is incorporated in the composition for the resist base layer film containing a siloxane-based polymer. <P>COPYRIGHT: (C)2008,JPO&INPIT |
