发明名称 VACUUM CHAMBER, AND SUBSTRATE TREATMENT APPARATUS HAVING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a vacuum chamber of high accuracy capable of preventing generation of particles. SOLUTION: The vacuum chamber for setting the inside of a predetermined closed space in a vacuum state or an atmospheric state comprises a housing for forming the closed space and a lid to be joined with the housing, an O-ring for sealing the vacuum state in the closed space formed of the housing and the lid, and an elastic body capable of preventing abrasion of joining surfaces of the housing and the lid caused by deformation of the housing and the lid when the vacuum state and the atmospheric state are repeated in the closed space. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007277667(A) 申请公布日期 2007.10.25
申请号 JP20060107996 申请日期 2006.04.10
申请人 SUMITOMO HEAVY IND LTD 发明人 YOSHIOKA HIDEO
分类号 C23C16/44;B01J3/00;B01J3/02;C23C14/00;H01L21/205;H01L21/3065 主分类号 C23C16/44
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