RESIST COMPOSITION FOR LIQUID IMMERSION EXPOSURE

摘要

Disclosed is a resist composition for liquid immersion exposure. The resist composition comprises: a polymer (A) having a repeat unit formed by the cyclopolymerization of a compound represented by the formula: CF<SUB>2</SUB>=CF-Q-CR=CH<SUB>2</SUB>, wherein the repeat unit is contained in an amount of 10 mol% or more relative to the total amount of all repeat units; and a polymer (B) whose alkali solubility can be increased by the action of an acid. In the formula above, R represents a hydrogen atom; and Q represents -CF<SUB>2</SUB>C(CF<SUB>3</SUB>)(OH)CH<SUB>2</SUB>-, -CH<SUB>2</SUB>CH(C(CF<SUB>3</SUB>)<SUB>2</SUB>(OH))CH<SUB>2</SUB>-, -CH<SUB>2</SUB>CH(C(O)OH)CH<SUB>2</SUB>-, -CF<SUB>2</SUB>CH(C(O)OH)CH<SUB>2</SUB>-, -CF<SUB>2</SUB>C(C(O)OH)<SUB>2</SUB>CH<SUB>2</SUB>- or the like.