METHOD FOR FORMING DIELECTRIC LAYER, AND DEVICE RELEVANT THERETO

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a dielectric layer, and a device relevant thereto. SOLUTION: The dielectric layer is formed by depositing a dielectric layer to a middle thickness and applying a nitriding treatment on the middle thickness dielectric layer. Then, the dielectric layer is deposited to a desired final thickness. COPYRIGHT: (C)2008,JPO&INPIT