发明名称 Pattern misalignment measurement method, program, and semiconductor device manufacturing method
摘要 A pattern misalignment measurement method includes acquiring an inspection image of a composite pattern formed by superposing a plurality of kinds of element patterns on each other, acquiring reference images of at least two kinds of element patterns from reference images which are images of reference patterns of the plurality of kinds of element patterns, performing first matching of each of the acquired reference images with the inspection image, and outputting misalignment between the element patterns in the composite pattern on the basis of the result of the first matching.
申请公布号 US2007248258(A1) 申请公布日期 2007.10.25
申请号 US20070785782 申请日期 2007.04.20
申请人 MITSUI TADASHI 发明人 MITSUI TADASHI
分类号 G06K9/00 主分类号 G06K9/00
代理机构 代理人
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