| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography device capable of producing an alignment marker on the rear side of a substrate. <P>SOLUTION: The lithography device is provided with an enclosure for forming a closed environment locally on the rear surface of the substrate, a seal for enclosing tightly the closed environment between the enclosure and the substrate, resist supplying systems (12, 13) for supplying resist, developing systems (14, 15) for supplying developer, and etching systems (16, 17) for etching one or a plurality of markers locally or the like. Further, a mask positioning system and an exposure system are provided also. <P>COPYRIGHT: (C)2008,JPO&INPIT |
