| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of lithography capable of forming a fine pattern and a device used therefor. <P>SOLUTION: A double treatment technology to manufacture a device that includes the execution of a first patterning step for forming an opening in a resist layer, then the opening is filled before a first resist layer is exfoliated and is replaced with a second resist layer used for a second exposure is disclosed. A lithographic cell includes an integrated filling and/or exfoliating unit that can be used to execute the foregoing technology. <P>COPYRIGHT: (C)2008,JPO&INPIT |
