| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce the demerit due to difference in the positional relation of a shot region and a measuring point among a plurality of shot regions, e.g., the local defocus. <P>SOLUTION: The aligner exposes a plurality of shot regions on a substrate coated with a photosensitive agent one after another through a projecting optical system. The aligner comprises a measuring instrument for measuring the surface position of a measuring point defined in the plurality of continuous shot regions while the substrate is scanned; and a controller for controlling the surface position of the substrate based on the measurement result of the measuring instrument, so that the exposed region of the substrate aligns with the image surface of the projection optical system. Measuring points are commonly disposed in the plurality of shot regions 401, 402. <P>COPYRIGHT: (C)2008,JPO&INPIT |
