| 摘要 |
A transistor apparatus includes a silicon substrate and a barrier structure extending substantially from generally adjacent the silicon substrate to a locus displaced from the silicon substrate. The barrier structure generally surrounds a volume containing connection loci for the transistor apparatus and a buried layer in a silicon medium. The connection loci and the buried layer occupy a space generally presenting a first lateral expanse generally parallel with the silicon substrate. The volume presents a second lateral expanse generally parallel with the silicon substrate. The second lateral expanse is greater than the first lateral expanse within a predetermined distance of the substrate.
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