| 摘要 |
A semiconductor device comprising a high-dielectric film in a part of a gate insulation film is provided by a more simplified method. In a semiconductor device having a first region and a second region, a first gate electrode, a second gate electrode and a high-dielectric gate insulation film are formed in the first region (core part). The first gate electrode and the second gate electrode have different composition ratios. The first gate electrode and the second gate electrode are formed on the high-dielectric gate insulation film. Furthermore, a third gate electrode and a fourth gate electrode and a SiON film or SiO<SUB>2 </SUB>film are formed in the second region (I/O part). Impurity elements doped in the third gate electrode and the fourth gate electrode are different in kind and/or concentration. In addition, the third gate electrode and the fourth gate electrode are formed on the SiON film or SiO<SUB>2 </SUB>film.
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