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发明名称
Gerät zur Hitzebehandlung von Halbleiterschichten bei niedriger Temperatur
摘要
申请公布号
DE60217646(T2)
申请公布日期
2007.10.25
申请号
DE20026017646T
申请日期
2002.05.16
申请人
VIATRON TECHNOLOGIES INC.
发明人
KIM, HYOUNG JUNE;SHIN, DONG HOON
分类号
G02F1/1368;H01L21/00;H01L21/20;H01L21/265;H01L21/324;H05B6/02;H05B6/10;H05B6/40
主分类号
G02F1/1368
代理机构
代理人
主权项
地址
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