| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a projection optical system which can project the image of a pattern for multiplex exposure efficiently on a substrate by controlling fall of throughput. <P>SOLUTION: The projection optical system comprises a first optical system 41 forming a first conjugate position CP1 based on an exposure beam through a first pattern PA1, a second optical system 42 forming a second conjugate position CP2 based on an exposure beam through a second pattern PA2, a third optical system 43 for conjugating a substrate and the first and second conjugate position optically based on the exposure beams from the first and second optical systems, and an optical system 50 for introducing the exposure beams from the first and second optical systems to the third optical system wherein a first exposure region is formed on the substrate based on the exposure beams from the first optical pattern, and a second exposure region is formed on the substrate based on the exposure beams from the second optical pattern. The first and second exposure regions overlap at least partially on the substrate. <P>COPYRIGHT: (C)2008,JPO&INPIT |
