发明名称 SUBSTRATE STRUCTURE WITH THIN FILM PATTERNED LAYER AND METHOD FOR MANUFACTURING SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate structure with a thin film patterned layer and a method of manufacturing the same. <P>SOLUTION: A substrate structure includes a substrate and a number of banks formed on the substrate. Adjacent banks and the substrate cooperatively define a number of accommodating rooms configured for accommodating ink. The substrate structure includes thin film patterned layers formed between the number of accommodating rooms, and the patterned layer covers the bank between at least two adjacent accommodating rooms. The method for manufacturing the substrate structure includes the steps of: providing a substrate; forming the plurality of banks on the substrate, the banks and the substrate cooperatively defining the plurality of accommodating rooms; discharging ink into accommodating rooms in a discharging device in such a manner that the ink covers the bank located between at least two adjacent accommodating rooms using a dispenser; drying and solidifying the ink in the accommodating rooms to form a patterned layer. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2007279725(A) 申请公布日期 2007.10.25
申请号 JP20070093110 申请日期 2007.03.30
申请人 ICF TECHNOLOGY CO LTD 发明人 CHOU CHING-YU;WANG YU-NING
分类号 G02B5/20;B05D1/26;B05D3/06 主分类号 G02B5/20
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