| 摘要 |
PROBLEM TO BE SOLVED: To provide a postprocessing apparatus with which a glass substrate for an FPD, of which the thickness is more and more reduced, is suitably handled. SOLUTION: The postprocessing apparatus EQU receives a stuck glass substrate GL of which the thickness is reduced with chemical polishing and conducts postprocessing thereafter. The postprocessing apparatus is constructed by being provided with a conveyance route using a roll RL to convey the glass substrate, an introducing section 1 to pass the received glass substrate to the conveyance route, and a deriving section 5 to receive and derive the glass substrate GL from the conveyance route. The introducing section 1 has a placing section 10 to hold the glass substrate, and a driving section 20 to erect and drop the placing section 10, and performs switching between the dropping state and the erecting state of the placing section 10 in accordance with the reciprocating motion of the driving section 20. COPYRIGHT: (C)2008,JPO&INPIT
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