| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a halftone phase shift mask capable of giving suitable light transmission to a halftone film according to the size of a pattern. <P>SOLUTION: The halftone phase shift mask has halftone films 12 provided on a translucent substrate 11 where light-shield patterns are formed and where half-light-shield patterns are formed, and light-shield films 13 provided on the halftone films 12 where the light-shield patterns are formed. Each of the half-light-shield patterns includes a first half-light-shield pattern made of a halftone film 12 and a second half-light-shield pattern which is smaller than the first half-light-shield pattern and made of a halftone film 12, and an element adjusting the light transmission of a light transmission path 32 is incorporated in the light transmission path 32 in an area including the second half-light-shield pattern. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
